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Ion Gun Model 1420
20kV Ion Gun
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Adjustable spot size ≥ 5um for spatially defined sputtering or implantation
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Emission regulated bombardment provides stable ion current
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Continuously variable beam energy 5kV to 20kV
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Dual octupole for beam scanning and astigmatism correction
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Pre-objective scanning for reduced spot size
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No direct filament to sample line of sight to avoid sample contamination
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Customer replaceable filaments and beam trimming apertures
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Dual filaments provide operational backup in case of filament end of life
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All UHV compatible and etch resistant materials used in fabrication
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Differential pumping to minimize main chamber gas load
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Operates over the range of inert gases and Nitrogen
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